•  X ray ionization for Wafer/reticle rinsing_spin drying equipment
X ray ionization for Wafer/reticle rinsing_spin drying equipment

Product Introduction

Soft x ray ionization to resolve electrostatic risks at wafer pressured water rinsing and the following spin drying process in SEMI wafer Fab or reticle (photomask) Fab.

-Customized window for high transmissions for soft X ray.

-Much faster electrostatic charge neutralization than corona discharge air ionizers.


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